Positive developer , liquid
For removing exposed resist during the positive photofabrication process.
Brand name(s) : MG Chemicals

Features:
•Dissolves exposed photoresist
•Concentrated formulation - dilute one part developer to ten parts water
•For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
•Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .